Lithography process and system

Patent name lithography process and system patent applicant Molecule Modeling Co., Ltd. Principal Applicant Address Austin, Texas Inventor S. Sriniva Umbrella; B.-J. Joey; M. Watts N.Sumamark; R.Feixin; M.Mess; R. Bernicatze; G. Wilson Application (Patent) No. 03866412.4 Date of Application 2003.07.10 Date of Issuing Certificate Approval No. 1668437 2005.09.14 Manual Disc No. D0537 Main Classification Number B29C33/42 Classification No. B29C33/42; B29C33/60; B29C35/08; B29C35/12; B29C41/02; B29C59/02; B29C59/16 Sub-item Original Claim No. 2002.7.11 US 10/194,414; 2002.7.11 US 10/194,991; 2002.7.11 US 10/194,411; 2002.7.11 US 10/194,410 Abstract This invention discloses the use of a device (3900) formed by lithographic printing Graphical substrate process, the apparatus includes a print head (3100), an active light source (3500), a motion stage (3600), a patterned template (3700), a print head support (3910), A motion platform support (3920), bridge support (3930) and a support table (39) 40). Slaves 1. A method of forming a pattern on a substrate using a template, the method comprising: positioning the template and the substrate in a spaced relation to each other such that a gap is formed between the template and the substrate; light activated light The solidified liquid substantially fills the gap; and cures light-activated photocurable liquids. International Application PCT/US2003/021556 2003.7.10 International Publication WO2004/016406 English 2004.2.26 Entering Country Date Patent Agency Shanghai Patent & Trademark Office Co., Ltd. Agency Address Zhang Minhua